Etude du comportement électrochimique et optique de couches minces d’oxyde de nickel (NiO) ; application en photovoltaïques

Abstract

This work concerns the synthesis and characterization of nickel oxide thin films by direct and pulsed electrodeposition on FTO electrodes. Nickel oxide was used to prepare composite films (P3HT-NiO) on ITO electrodes by the spin-coating method. The analysis of the electrochemical, morphological properties of FTO/NiO and ITO/(P3HT-NiO) was performed by various DRX, AFM, MEB, MET, and UV-visible spectroscopy techniques. FTO / NiO thin films and ITO / (P3HT-NiO) composite films were used as examples for their application as active materials in supercapacitors. Electrochemical performances were evaluated by cyclic voltammetry, galvanostatic charge-discharge tests, electrochemical impedance spectroscopy (SIE) and photocurrent measurement. The specific capacity obtained for the direct electroplated NiO is about 250 Fg-1, this value was increased up to 1000 Fg-1 for the NiO film prepared by electrodeposition pulsed at 5 Ag-1. The result obtained shows that the photocurrent increases 5 times for a rate of 10% of NiO for the film ITO/(P3HT-NiO) compared to ITO/P3HT alone.