Croissance et étude des propriétés des nanostructures de cobalt obtenues par électrodéposition

Abstract

The study of electrodeposition of magnetic nanostructures on semiconductor surfaces is a very important process that it is from the fundamental point of view or the applications. The present work is interested for the influence of substrate types on the electrodeposition process and the properties of Co nanostructures deposited onto n-Si(111) and p-Si(111) from Watts bath. Electrochemical study show for both substrats, the Co deposited occurs by instantaneous nucleation mode of 3D islands followed by diffusion-limited growth. Ex situ AFM images have revealed the granular character and compact structure which is influenced by the substrates types. The deposits formed a weak crystallization state and showed the presence of different phases of Co hcp and fcc structures. The magnetization obtained from AGFM curves indicate that the easy axis is in the plane of the film.