Elaboration And Characterization Of Semiconductor Thin Films Based On Zinc Oxide (ZnO)

Abstract

In this work we developed thin layers of ZnO by the Sol-Gel method (Dip-Coating) achieved during this study. The structural characterization of the thin films was performed by X-ray diffraction (XRD), Morphological characterization was performed by scanning electronic microscopy (SEM) and atomic Force Microscope (AFM). Optical characterization was performed by visible UV radiation. XRD made it possible to confirm the crystal state of our thin films as well as the composition of the ZnO. Show both characterization by SEM and AFM detailed filming surface condition. Finally, UVVis-NIR spectrophotometry allowed us to measure the transmission of thin films based on ZnO